Publications in Scientific Journals:
B. C. Bayer, C. Castellarin-Cudia, R. Blume, S. Steiner, C. Ducati, D. Chu, A. Goldoni, A. Knop-Gericke, R. Schlögl, C. Cepek, J. Robertson, S. Hofmann:
"Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes";
RSC Advances,
12
(2013),
4086
- 4092.
German abstract:
Tantalum-oxide thin films are shown to catalyse single- and multi-walled carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO2) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to Ta-metal or Ta-carbide occurs during our nanotube growth conditions and that the catalytically active phase is the Ta-oxide phase. Such a reduction-free oxide catalyst can be technologically advantageous.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1039/C3RA23304A
Created from the Publication Database of the Vienna University of Technology.