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Publications in Scientific Journals:

A Kirnbauer, A. Kretschmer, C.M. Koller, T. Wojcik, V. Paneta, M. Hans, J.M. Schneider, P. Polcik, P.H. Mayrhofer:
"Mechanical properties and thermal stability of reactively sputtered multi- principal-metal Hf-Ta-Ti-V-Zr nitrides";
Surface & Coatings Technology, 389 (2020), 125674.



English abstract:
Crystalline (Hf,Ta,Ti,V,Zr)N nitride thin films, with a high-entropy metal-sublattice, were synthesized at 440 °C by reactive magnetron sputtering using an equimolar Hf-Ta-Ti-V-Zr-compound target. The coatings are single-phase fcc structured mono-nitrides for N2/(Ar + N2) flow-rate-ratios (fN2) between 30 and 45%. For higher fN2 a small fraction of a second phase (next to the fcc matrix) can be detected by X-ray diffraction (XRD) and selected area electron diffraction (SAED). All coatings studied (prepared with fN2 between 30 and 60%) show similar chemical compositions and hardness (H) values between 30.0 and 34.0 GPa with indentation moduli of ~460 GPa. Atom probe tomography (APT) indicates a homogenous distribution of all elements within our fcc-(Hf,Ta,Ti,V,Zr)N even after vacuum-annealing at 1300 °C. While H decreased from 32.5 to 28.1 GPa by this annealing treatment, the coating is still single-phase fcc structured with a defect density (expressed by XRD and SAED features, transmission electron microscopy contrast, and grain sizes) comparable to the as-deposited state. Only after vacuum-annealing at 1500 °C, XRD and APT reveal the formation of hexagonal structured (Ta,V)2N. The onset of nitrogen-loss - detected by thermogravimetric analysis - is ~1350 °C.
Based on our results we can conclude that the sluggish diffusion within our fcc-(Hf,Ta,Ti,V,Zr)N warrants the single-phase fcc structure up to 1300 °C, although ab initio based calculations would suggest the lower-entropy products [fcc-(Hf,Zr)N, fcc-(Ta,V)N, and fcc-TiN] and [fcc-(Hf,Zr)N and fcc-(Ta,Ti,V)N] to be energetically more stable up to 1302 K.

Keywords:
Chemically complex alloys, High-entropy alloys (HEAs), High-entropy nitrides, Multi-principal element nitrides, Magnetron sputtering, Thermal stability


"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1016/j.surfcoat.2020.125674


Created from the Publication Database of the Vienna University of Technology.