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Publications in Scientific Journals:

L. Ruppitsch, G. Peer, K. Ehrmann, T. Koch, R. Liska:
"Photopolymerization of difunctional cyclopolymerizable monomers with low shrinkage behavior";
Journal of Polymer Science Part A: Polymer Chemistry, 59 (2021), 6; 519 - 531.



English abstract:
Cyclopolymerizable monomers (CPM) have been the focus of investigations for over 70 years due to favorably low shrinkage upon polymerization, yet little research dealt with difunctional CPMs, especially in the field of radical photo-polymerization. Herein, we synthesized novel difunctional 1,6-diene CPMs based on the isomeric mixture of (2,2,4)/(2,4,4)-trimethylhexane-1,6-diamine as spacer unit, which undergoes cyclopolymerization forming five- or six-membered ring structures in the polymer backbone upon photo-polymerization. Different photopolymerizable moieties (allyl-, methacryloyl-, and ester-activated allyl-moieties) were chosen for modification of the spacer unit to investigate their influence on reactivity and shrinkage behavior. The (thermo)mechanical properties of the cured difunctional 1,6-diene CPMs fur-ther reveal the effect of reactivity-enhancing electron-withdrawing groups (e.g., ester and carbonyl groups) on the final polymer network. For compari-son, similar difunctional monoene compounds were are also synthesized and characterized to illustrate the low shrinkage behavior of the novel difunctional 1,6-diene CPMs.

Keywords:
cyclopolymerization, difunctional cyclopolymerizable monomers, double bond activation, low shrinkage monomers, radical photopolymerization


"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1002/pol.20200863

Electronic version of the publication:
https://onlinelibrary.wiley.com/doi/full/10.1002/pol.20200863


Created from the Publication Database of the Vienna University of Technology.