Talks and Poster Presentations (with Proceedings-Entry):
F. Rodrigues, L.F. Aguinsky, A. Toifl, A. Scharinger, A. Hössinger, J. Weinbub:
"Surface Reaction and Topography Modeling of Fluorocarbon Plasma Etching";
Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Dallas, Texas (USA);
2021-09-27
- 2021-09-29; in: "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)",
(2021),
229
- 232.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/SISPAD54002.2021.9592583
Electronic version of the publication:
https://www.iue.tuwien.ac.at/pdf/ib_2021/CP2021_Rodrigues_2.pdf
Created from the Publication Database of the Vienna University of Technology.