Publications in Scientific Journals:
L.F. Aguinsky, F. Rodrigues, G. Wachter, M. Trupke, U. Schmid, A. Hössinger, J. Weinbub:
"Phenomenological Modeling of Low-Bias Sulfur Hexafluoride Plasma Etching of Silicon";
Solid-State Electronics (invited),
191
(2022),
108262-1
- 108262-8.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1016/j.sse.2022.108262
Electronic version of the publication:
https://www.iue.tuwien.ac.at/pdf/ib_2022/JB2022_Aguinsky_1.pdf
Created from the Publication Database of the Vienna University of Technology.